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0.35 um and sub-0.35 um Matal Stack Etch in a DPS Chamber - DPS Chamber and Process Characterization

Author(s):
Ye, Y.
Ma, D.
Hanawa, H.
Loewenhardt, P.
Zhao, A.
Shiau, J.
Yan, C.
Webb, T.
Mak, S.
Papanu, J.
Yin, G.
6 more
Publication title:
Proceedings of the eleventh International Symposium on Plasma Processing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-12
Pub. Year:
1996
Page(from):
222
Page(to):
233
Pages:
12
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771641 [1566771641]
Language:
English
Call no.:
E23400/962354
Type:
Conference Proceedings

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