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ECR, ICP and RIE plasma etching of GaN

Author(s):
Shul, R.J.
McClellan, G.B.
Rieger, D.J.
Hafich, M.J.
Drummond, T.J.
Pearton, S.J.
Abernathy, C.R.
Constantine, C.
Barratt, C.
Karlicek, R.F., Jr.
Tran, A.C.
Schurmann, M.
7 more
Publication title:
Proceedings of the First Symposium on III-V Nitride Materials and Processes
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-11
Pub. Year:
1996
Page(from):
159
Page(to):
167
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771634 [1566771633]
Language:
English
Call no.:
E23400/962353
Type:
Conference Proceedings

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