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Stress of ECR Plasma CVD Si3N4 Films on FZ-Si

Author(s):
Zaitsu, Y.
Shimizu, T.
Matsumoto, S.
Yosbida, M.
Abe, T.
Arai, E.
1 more
Publication title:
Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-4
Pub. Year:
1996
Page(from):
288
Page(to):
297
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771542 [1566771544]
Language:
English
Call no.:
E23400/961823
Type:
Conference Proceedings

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