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Profile and Morphology Control During Etching of SiC Using Electron Cyclotron Resonant (ECR) Plasmas

Author(s):
Flemish, J.R.  
Publication title:
Proceedings of the Symposium on Wide Bandgap Semiconductors and Devices and the Twenty-Third State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXIII)
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
95-21
Pub. Year:
1995
Page(from):
231
Page(to):
235
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771160 [1566771161]
Language:
English
Call no.:
E23400/961020
Type:
Conference Proceedings

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