Blank Cover Image

THE EFFECTS OF REVERSING WAFER-SURFACE WETTING PROPERTIES OF SULFURIC ACID:HYDROGEN PEROXIDE WAFER-CLEANING SOLUTIONS

Author(s):
Publication title:
Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
95-20
Pub. Year:
1995
Page(from):
60
Page(to):
65
Pages:
6
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771153 [1566771153]
Language:
English
Call no.:
E23400/962140
Type:
Conference Proceedings

Similar Items:

Syverson, W., Fleming, M.

Electrochemical Society

Syverson, William A., Joseph Fleming, M.

Electrochemical Society

Mertens, P.W., Verhaverbeke, S., Heyns, M.M., Hellemans, L., Snauwaert, J., Dillenbeck, K.

Electrochemical Society

Chiarello, R. P., Parker, R., Helms, C. R., Chen, W., Tang, S., Cook, L. J.

MRS - Materials Research Society

Wilson, S. L., Jones, C. W.

Elsevier

Mayuri Razdan, David Hall, David W. Shoesmith

Materials Research Society

Nam, C. W., Ashok, S., Tsai, W., Day, M. E.

MRS - Materials Research Society

Clews, P.J., Nelson, G.C., Matlock, C.A., Resnick, P.J., Adkins, C.L.J., Korbe, N.C.

Electrochemical Society

V. Macary, G. SarrabaYrouse, M. Bafleur, J.M. Reynes, A.P. Lavigne, A. Claverie

Electrochemical Society

Helms, C.R., Park, H.

Electrochemical Society

J.-S. Jeon, S. Raghavan, J. Lowell, V. Wenner

Society of Photo-optical Instrumentation Engineers

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12