Direct Bonding of LPCVD Silicon Oxide Thin Films Deposited from N2O and SiH4

Direct Bonding of LPCVD Silicon Oxide Thin Films Deposited from N2O and SiH4

Author(s):

Publication title:

Proceedings of the Third International Symposium on Semiconductor Wafer Bonding : physics and applications

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

95-7

Pub. Year:

1995

Page(from):

573

Page(to):

578

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771016 [1566771013]

Language:

English

Call no.:

E23400/952067

Type:

Conference Proceedings

Details

TDL ID:	ZA00013814
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Semiconductor Wafer Bonding
Conf. info. (Number):	3rd
Conf. info. (Venue):	Reno, Nevada, USA
Conf. info. (Date):	1995.00.00

Similar Items:

1 Conference Proceedings SURFACE ROUGHNESS INVESTIGATION OF THIN SiO2 FILMS DEPOSITED FROM N2O AND SiH4 Watt, V. H. C., Moinpour, M., Sadjadi, R., Lu, W., Neubauer, G., Bower, R. MRS - Materials Research Society	7 Conference Proceedings Comparison of experimental and theoretical curvature considerations for direct wafer bonding Hong,L.N., Bower,R.W. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Mechanical Considerations for Direct Wafer Bonding Bower, R.W., Hung, L., Chan, W., Watt, V.H.C. Electrochemical Society	8 Conference Proceedings COMPOSITION AND PROPERTIES OF PECVD SILICON NITRIDE FILMS DEPOSITED FROM SiH4, N2, He GASES Souk, J.H., Parsons, G.N., Batey, J. Materials Research Society
3 Conference Proceedings Characterization Of Silicon Dioxide Films Deposited In A Vertical Diffusion Furnace For Medium Temperature Applications Watt, V.H.C., Nakatani, D., Moinpour, M., Hwang, D., Lu, W. Electrochemical Society	9 Conference Proceedings Fluorinated Silicon Nitride Film Deposited at Low Temperatures from SiH4-SiF4-NH3 Park, Y-B., Rhee, S., Choi, J-H., Kim, C-W., Suok, J. H. MRS - Materials Research Society
4 Conference Proceedings TEOS/Ozone APCVD Thin SiO2 Sub 0.5 mm LDD Spacer Applications Moinpour, M., Lu, W.-J., Sadjadi, R., Li, J., Moghadam, F., Wada, O., Watt, V.H.C. Electrochemical Society	10 Conference Proceedings Development of Silicon Nitride Films for Gate Dielectric Applications Brady, D., Watt, V.H.C., Karamcheti, A., Vishnubhotla, L., Bersuker, G., Kim, S., Zietzoff, P., Gilmer, M., Guan, J., … Electrochemical Society
5 Conference Proceedings Applications of Low Temperature Direct Bonding in Microsensor Structures Robert W. Bower, Victor H.C. Watt, Rajagopal Sundararaman, Winnie Chan Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Silicon Oxynitride Films formed by Rapid Ther-mal Chemical Vapor Deposition for VLSI Applications Vogel, E.M., Wortman, J.J., McLarty, P.K., Watt, V.H.C., Kirkpatrick, B. Electrochemical Society
6 Conference Proceedings Highly Efficient Microcrystalline Silicon Solar Cells Deposited From a Pure SiH4 Flow M. N. van den Donker, B. Rech, R. Schmitz, J. Klomfass, G. Dingemans, F. Finger, L. Houben, W. M. M. Kessels, M. C. M. … Materials Research Society	12 Conference Proceedings In-Situ Reactor Analysis For Silicon Nitride And Silicon Dioxide Thin Films: Current Status And Future Challenges Moinpour, M. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12