An advanced 0.35 μm shallow SIMOX/CMOS technology for low power, high speed applications
- Author(s):
- Publication title:
- Proceedings of the Seventh International Symposium on Silicon-on-Insulator Technology and Devices
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 96-3
- Pub. Year:
- 1995
- Page(from):
- 406
- Page(to):
- 413
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771535 [1566771536]
- Language:
- English
- Call no.:
- E23400/962142
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
7
Conference Proceedings
Design of radiation hard CMOS APS image sensors in a 0.35-μm standard process
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
A fully integrated low-noise amplifier in SiGe 0.35μm technology for 802.11 a WIFI applications
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
A fully integrated folded mixer in CMOS 0.35 m technology for 802.11a WIFI applications
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
5-GHz optical front-end for active pixel applications in standard 0.35-μm CMOS
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Sub-0.35-μm i-line lithography with new advanced bottom antireflective coatings optimized for high-topography and dual-damascene applications
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Multiphase clock generators with controlled clock impulse width for programmable high order rotator SC FIR filters realized in 0.35μm CMOS technology
SPIE - The International Society of Optical Engineering |