Selective Remote Plasma Etching of Si3N4 Over SIO2 at Elevated Temperature
- Author(s):
Staffa, J. Luther, B. Hwang, D. Ruzyllo, J. Grant, R. March, D. - Publication title:
- ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 95-5
- Pub. Year:
- 1995
- Page(from):
- 283
- Page(to):
- 289
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770996 [1566770998]
- Language:
- English
- Call no.:
- E23400/952065
- Type:
- Conference Proceedings
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