Modeling of Plasma Etch Dynamics Using Linear and Nonlinear Models
- Author(s):
- Publication title:
- Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 95-2
- Pub. Year:
- 1995
- Page(from):
- 218
- Page(to):
- 234
- Pages:
- 17
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770965 [1566770963]
- Language:
- English
- Call no.:
- E23400/952062
- Type:
- Conference Proceedings
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