High-power sources for EUV lithography: state of the art

High-power sources for EUV lithography: state of the art

Author(s):

Stamm, U. ( XTREME technologies GmbH (Germany) )

Kleinschmidt, J. ( XTREME technologies GmbH (Germany) )

Gaebel, K.M. ( XTREME technologies GmbH (Germany) )

Birner, H. ( XTREME technologies GmbH (Germany) )

Ahmad, I. ( XTREME technologies GmbH (Germany) )

Bolshukhin, D. ( XTREME technologies GmbH (Germany) )

Brudermann, J. ( XTREME technologies GmbH (Germany) )

Chinh, T.D. ( XTREME technologies GmbH (Germany) )

Flohrer, F. ( XTREME technologies GmbH (Germany) )

Goetze, S. ( XTREME technologies GmbH (Germany) )

Hergenhan, G. ( XTREME technologies GmbH (Germany) )

Kloepfel, D. ( XTREME technologies GmbH (Germany) )

Korobochko, V. ( XTREME technologies GmbH (Germany) )

Mader, B. ( XTREME technologies GmbH (Germany) )

Mueller, R. ( XTREME technologies GmbH (Germany) )

Ringling, J. ( XTREME technologies GmbH (Germany) )

Schriever, G. ( XTREME technologies GmbH (Germany) )

Ziener, C. ( XTREME technologies GmbH (Germany) )

13 more

Publication title:

High-Power Laser Ablation V

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5448

Pub. Year:

2004

Page(from):

722

Page(to):

736

Pages:

15

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453716 [0819453714]

Language:

English

Call no.:

P63600/5448.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013801
Series ID:	PA00000029
Conf. info. (Name):	High-Power Laser Ablation
Conf. info. (Number):	2004 : 5th
Conf. info. (Venue):	Taos, NM, USA
Conf. info. (Date):	2004.04.25-2004.04.30

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