High-power laser plasma EUV light source for lithography

High-power laser plasma EUV light source for lithography

Author(s):: Endo, A. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Publication title:: High-Power Laser Ablation V
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5448
Pub. Year:: 2004
Page(from):: 704
Page(to):: 711
Pages:: 8
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819453716 [0819453714]
Language:: English
Call no.:: P63600/5448.2
Type:: Conference Proceedings

Details

TDL ID:	ZA00013801
Series ID:	PA00000029
Conf. info. (Name):	High-Power Laser Ablation
Conf. info. (Number):	2004 : 5th
Conf. info. (Venue):	Taos, NM, USA
Conf. info. (Date):	2004.04.25-2004.04.30

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