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The masks fabricated by UV LIGA for excimer laser ablation and x-ray lithography

Author(s):
Liang, J. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) )
Le, Z. ( Zhejiang Univ. of Technology (China) )
Wang, W. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) )
Peng, L. ( BEPC National Lab. (China) )
Lan, W. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) )
Ming, A. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) )
Ye, J. ( Zhejiang Univ. of Technology (China) )
Quan, B. ( Zhejiang Univ. of Technology (China) )
Yao, J. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) )
Xuan, M. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) )
Wang, L. ( Changchun Institute of Optics, Fine Mechanics and Physics (China) )
6 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
975
Page(to):
984
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.2
Type:
Conference Proceedings

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