Feedforward correction of mask image placement for proximity electron lithography

Feedforward correction of mask image placement for proximity electron lithography

Author(s):

Omori, S. ( Sony Corp. (Japan) )

Nohdo, S. ( Sony Corp. (Japan) )

Motohashi, T. ( Sony Corp. (Japan) )

Kitagawa, T. ( Sony Corp. (Japan) )

Susa, T. ( Toppan Printing Co., Ltd. (Japan) )

Yotsui, K. ( Toppan Printing Co., Ltd. (Japan) )

Itoh, K. ( Toppan Printing Co., Ltd. (Japan) )

Tamura, A. ( Toppan Printing Co., Ltd. (Japan) )

3 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5446

Pub. Year:

2004

Page(from):

906

Page(to):

914

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

Language:

English

Call no.:

P63600/5446.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013799
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2004 : 11th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2004.04.14-2004.04.16

Similar Items:

1 Conference Proceedings Litho-and-mask concurrent approach to the critical issues for proximity electron lithography Omori, S., Iwase, K., Amai, K., Watanabe, Y., Nohama, S., Nohdo, S., Moriya, S., Kitagawa, T., Yotsui, K., Suzuki, G., … SPIE - The International Society of Optical Engineering	7 Conference Proceedings On-site use of 1x stencil mask: control over image placement and dimension Omori, S., Iwase, K., Watanabe, Y., Amai, K., Sasaki, T., Nohama, S., Ashida, I., Moriya, S., Kitagawa, T. SPIE-The International Society for Optical Engineering
2 Conference Proceedings A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging Iwase, K., Omori, S., Nohama, S., Yotsui, K., Suzuki, G., Sasaki, Y., Itoh, K., Tamura, A., Maruyama, S., Moriya, S., … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Defect inspection strategy of LEEPL masks [5853-82] Yonekura, I., Kunitani, S., Susa, T., Itoh, K., Tamura, A., Maruyama, S. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Alignment accuracy of LEEPL: image placement error correction Nohdo, S., Motohashi, T., Shimazu, N., Nakano, H., Omori, S., Kitagawa, T., Moriya, S. SPIE-The International Society for Optical Engineering	9 Conference Proceedings First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results Kitagawa, T., Yoshizawa, M., Iwase, K., Omori, S., Nohama, S., Nakano, H., Moriya, S., Kawahira, H. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Global image placement of LEEPL mask Eguchi, H., Susa, T., Sumida, T., Kurosu, T., Yoshii, T., Yotsui, K., Sugimura, H., Itoh, K., Tamura, A. SPIE - The International Society of Optical Engineering	10 Conference Proceedings New mask format low-energy electron-beam proximity projection lithography Koike, K., Omori, S., Iwase, K., Ashida, I., Moriya, S. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Image placement of large window-size membrane for EPL and LEEPL mask [5853-80] Eguchi, H., Sumida, T., Susa, T., Negishi, Y., Kurosu, T., Yoshii, T., Yamazaki, T., Yotsui, K., Sugimura, H., Tamura, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Advanced image placement performance for the current EPL masks [6151-53] Eguchi, H., Sugimura, H., Koike, K., Sakaue, H., Arimoto, H., Ogawa, K., Susa, T., Kunitani, S., Kurosu, T., Yoshii, T., … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Imaging capability of low-energy electron-beam proximity-projection lithography toward the 65/45-nm node Nkano, H., Nohda, S., Oguni, K., Motohashi, T., Yoshizawa, M., Kitagawa, T., Moriya, S. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Imaging capability of low-energy electron-beam proximity projection lithography toward the 70-nm node Nakano, H., Oguni, K., Nohdo, S., Koike, K., Moriya, S. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12