High-alignment-accuracy EB writing of phase shift image for 65-nm node masks
- Author(s):
- Kimura, N. ( JEOL Ltd. (Japan) )
- Komagata, T. ( JEOL Ltd. (Japan) )
- Nakagawa, Y. ( JEOL Ltd. (Japan) )
- Gotoh, N. ( JEOL Ltd. (Japan) )
- Tanaka, K. ( JEOL Ltd. (Japan) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 675
- Page(to):
- 680
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.2
- Type:
- Conference Proceedings
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