DUV ALTA system aerial image enhancement for improved pattern fidelity: phase II

DUV ALTA system aerial image enhancement for improved pattern fidelity: phase II

Author(s):

Ungureit, M.E. ( Etec Systems Inc. (USA) )

Howells, S.C. ( Etec Systems Inc. (USA) )

Chabreck, T. ( Etec Systems Inc. (USA) )

Hubbard, J. ( Etec Systems Inc. (USA) )

Klatchko, A. ( Etec Systems Inc. (USA) )

Pirogovsky, P.Y. ( Etec Systems Inc. (USA) )

Teitzel, R.L. ( Etec Systems Inc. (USA) )

Berwick, A. ( Etec Systems Inc. (USA) )

Skyborg, B. ( Etec Systems Inc. (USA) )

Allen, P.C. ( Etec Systems Inc. (USA) )

Morgante, C.G. ( Etec Systems Inc. (USA) )

White, M. ( Etec Systems Inc. (USA) )

7 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5446

Pub. Year:

2004

Page(from):

643

Page(to):

656

Pages:

14

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

Language:

English

Call no.:

P63600/5446.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013799
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2004 : 11th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2004.04.14-2004.04.16

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