Study of alternating phase shift mask structures for ArF lithography

Study of alternating phase shift mask structures for ArF lithography

Author(s):

Kojima, Y. ( Toppan Printing Co., Ltd. (Japan) )

Konishi, T. ( Toppan Printing Co., Ltd. (Japan) )

Sasaki, J. ( Toppan Printing Co., Ltd. (Japan) )

Tanaka, K. ( Toppan Printing Co., Ltd. (Japan) )

Komizo, T. ( Toppan Printing Co., Ltd. (Japan) )

Morita, M. ( Toppan Printing Co., Ltd. (Japan) )

Shirasaki, M. ( Toppan Printing Co., Ltd. (Japan) )

Ohshima, T. ( Toppan Printing Co., Ltd. (Japan) )

Takahashi, H. ( Toppan Printing Co., Ltd. (Japan) )

Chiba, K. ( Toppan Printing Co., Ltd. (Japan) )

Otaki, M. ( Toppan Printing Co., Ltd. (Japan) )

Okuda, Y. ( Toppan Printing Co., Ltd. (Japan) )

7 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5446

Pub. Year:

2004

Page(from):

570

Page(to):

577

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

Language:

English

Call no.:

P63600/5446.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013799
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2004 : 11th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2004.04.14-2004.04.16

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