Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond
- Author(s):
Chou, S.-Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Shin, J.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Shu, K.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) You, J.-W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Shiu, L.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chang, B.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Gau, T.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 508
- Page(to):
- 515
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.2
- Type:
- Conference Proceedings
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