Double dipole lithography for 65-nm node and beyond: a technology readiness review
- Author(s):
Hsu, S.D. ( ASML MaskTools, Inc. (USA) ) Eurlings, M. ( ASML Netherlands B.V. (Netherlands) ) Hendrickx, E. ( IMEC (Belgium) ) Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) Chiou, T.-B. ( ASML Technology Development Ctr. Asia (Taiwan) ) Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Laidig, T.L. ( ASML MaskTools, Inc. (USA) ) Shi, X. ( ASML MaskTools, Inc. (USA) ) Finders, J. ( ASML Netherlands B.V. (Netherlands) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 481
- Page(to):
- 498
- Pages:
- 18
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.2
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Experimental verification of a model-based decomposition method for double dipole lithography
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL)
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |