Photomask quality assessment solution for 90-nm technology node
- Author(s):
Ohira, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Chung, D.H.P. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Nobuyuki, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Tateno, M. ( NEC Corp. (Japan) ) Matsumura, K. ( NEC Corp. (Japan) ) Chen, J.-H. ( Synopsys, Inc. (USA) ) Luk-Pat, G.T. ( Synopsys, Inc. (USA) ) Fukui, N. ( Synopsys, Inc. (USA) ) Tanaka, Y. ( Synopsys, Inc. (USA) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 364
- Page(to):
- 374
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.1
- Type:
- Conference Proceedings
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