257-nm wavelength mask inspection for 65-nm node reticles

257-nm wavelength mask inspection for 65-nm node reticles

Author(s):

Yoshikawa, R. ( Toshiba Corp. (Japan) )

Tanizaki, H. ( Toshiba Corp. (Japan) )

Watanabe, T. ( Toshiba Corp. (Japan) )

Inoue, H. ( Toshiba Corp. (Japan) )

Ogawa, R. ( Toshiba Corp. (Japan) )

Endo, S. ( NuFlare Technology, Inc. (Japan) )

Ikeda, M. ( NuFlare Technology, Inc. (Japan) )

Takahashi, Y. ( NuFlare Technology, Inc. (Japan) )

Watanabe, H. ( Toshiba Corp. (Japan) )

4 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5446

Pub. Year:

2004

Page(from):

313

Page(to):

319

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

Language:

English

Call no.:

P63600/5446.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013798
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2004 : 11th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2004.04.14-2004.04.16

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