Results from a new die-to-database reticle inspection platform
- Author(s):
Broadbent, W.H. ( KLA-Tencor Corp. (USA) ) Wiley, J.N. ( KLA-Tencor Corp. (USA) ) Saidin, Z.K. ( KLA-Tencor Corp. (USA) ) Watson, S.G. ( KLA-Tencor Corp. (USA) ) Alles, D.S. ( KLA-Tencor Corp. (USA) ) Zurbrick, L.S. ( KLA-Tencor Corp. (USA) ) Mack, C.A. ( KLA-Tencor Corp. (USA) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 265
- Page(to):
- 278
- Pages:
- 14
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.1
- Type:
- Conference Proceedings
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