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Evaluation, reduction, and monitoring of progressive defects on 193-nm reticles for low-k1 process

Author(s):
Shiao, C.H. ( Winbond Electronics Corp. (Taiwan) )
Tsai, C.-C. ( Winbond Electronics Corp. (Taiwan) )
Hsu, T. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Tuan, S. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Chang, D. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Chen, R. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Hsieh, F. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
225
Page(to):
230
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.1
Type:
Conference Proceedings

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