Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing
- Author(s):
Kim, Y.-D. ( Photronics PKL Co., Ltd. (South Korea) ) Kim, D.-W. ( Photronics PKL Co., Ltd. (South Korea) ) Lee, D.-S. ( Photronics PKL Co., Ltd. (South Korea) ) Jang, P.-J. ( Photronics PKL Co., Ltd. (South Korea) ) Kwon, H.-J. ( Photronics PKL Co., Ltd. (South Korea) ) Cho, H.-J. ( Photronics PKL Co., Ltd. (South Korea) ) Kim, J.-M. ( Photronics PKL Co., Ltd. (South Korea) ) Choi, S.-S. ( Photronics PKL Co., Ltd. (South Korea) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 193
- Page(to):
- 199
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.1
- Type:
- Conference Proceedings
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