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Global CD uniformity improvement for CAR masks by adaptive post-exposure bake with CD measurement feedback

Author(s):
Berger, L. ( STEAG HamaTech AG (Germany) )
Saule, W. ( STEAG HamaTech AG (Germany) )
Dress, P. ( STEAG HamaTech AG (Germany) )
Gairing, T.M. ( STEAG HamaTech AG (Germany) )
Chen, C.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lee, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5446
Pub. Year:
2004
Page(from):
148
Page(to):
154
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
Language:
English
Call no.:
P63600/5446.1
Type:
Conference Proceedings

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