Mask patterning process using the negative tone chemically amplified resist TOK OEBR-CAN024

Mask patterning process using the negative tone chemically amplified resist TOK OEBR-CAN024

Author(s):

Irmscher, M. ( IMS Chips (Germany) )

Beyer, D. ( Leica Microsystems Lithography GmbH (Germany) )

Butschke, J. ( IMS Chips (Germany) )

Hudek, P. ( Leica Microsystems Lithography GmbH (Germany) )

Koepernik, C. ( IMS Chips (Germany) )

Plumhoff, J. ( Unaxis USA, Inc. (USA) )

Rausa, E. ( Unaxis USA, Inc. (USA) )

Sato, M. ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )

Voehringer, P. ( IMS Chips (Germany) )

4 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5446

Pub. Year:

2004

Page(from):

46

Page(to):

57

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

Language:

English

Call no.:

P63600/5446.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013798
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2004 : 11th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2004.04.14-2004.04.16

Similar Items:

1 Conference Proceedings 90-nm mask making processes using the positive tone chemically amplified resist FEP171 Butschke, J., Beyer, D., Constantine, C., Dress, P., Hudek, P., Irmscher, M., Koepernik, C., Krauss, C., Plumhoff, J., … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z Plontke, R., Bettin, L., Beyer, D., Butschke, J., Irmscher, M., Koepernik, C., Leibold, B., Vix, A. B. E., Voehringer, … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making Irmscher, M., Berger, L., Beyer, D., Butschke, J., Dress, P., Hoffmann, T., Hudek, P., Koepernik, C., Tschinkl, M., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Patterning performance of most recent e-beam-sensitive CARs for advanced mask making: an update Schwersenz, A., Butschke, J., Feicke, A., Irmscher, M., Voehringer, P. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Alternating aperture phase shift mask process using e-beam lithography for the second level Koepernik, C., Butschke, J., Beyer, D., Irmscher, M., Leibold, B., Rausa, E., Plontke, R., Plumhoff, J., Voehringer, P. SPIE - The International Society of Optical Engineering	9 Conference Proceedings STEAG HamaTech resist coater ASR5000: tool concept and process results Krauss, C., Dietze, U.U., Xu, F., Koepernik, C., Dress, P., Voehringer, P., Irmscher, M., Szekeresch, J. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Mask pafferning using chemically amplified resists and the novel STEAG HamaTech blank coater ASR5000 Koepernik, C., Beyer, D., Dress, P., Hoffmann, T., Hudek, P., Irmscher, M., Krauss, C., Leibold, B., Mueller, D., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Patterning of Ta/Si02 high transmission EAPSM material for 193nm technology [5853-26] Koepernik, C., Becker, H. W., Butschke, J., Buttgereit, U., Irmscher, M., Nedelmann, L., Schmidt, F., Teuber, S. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Comparative evaluation of e-beam sensitive chemically amplifild resists for mask making Irmscher, M., Beyer, D., Butschke, J., Constantine, C., Hoffmann, T., Koepernik, C., Krauss, C., Leibold, B., Letzkus, … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Resistless mask structuring using an ion multi-beam projection pattern generator J. Butschke, M. Irmscher, F. Letzkus, H. Loeschner, L. Nedelmann Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Second-level imaging of advanced alternating phase-shift masks using e-beam lithography Leibold, B., Butschke, J., Bettin, L., Beyer, D., Irmscher, M., Koepernik, C., Plontke, R., Vix, A., Voehringer, P. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Fine-pattern process with negative tone resist Hoshino,E., Uraguchi,M., Yamamoto,Y., Sato,Y., Minagawa,K., Suzuki,K., Watanabe,K. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12