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Etching mechanism of Au thin films in Cl2/Ar inductively coupled plasma

Author(s):
  • Efremov, A. ( Ivanovo State Univ. of Chemistry and Technology (Russia) and Chung-Ang Univ. (South Korea) )
  • Svettsov, V. ( Ivanovo State Univ. of Chemistry and Technology (Russia) )
  • Kim, C.-I. ( Chung-Ang Univ. (South Korea) )
Publication title:
Micro- and Nanoelectronics 2003
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5401
Pub. Year:
2004
Page(from):
72
Page(to):
78
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453242 [0819453242]
Language:
English
Call no.:
P63600/5401
Type:
Conference Proceedings

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