Active membrane masks for improved overlay performance in proximity lithography

Active membrane masks for improved overlay performance in proximity lithography

Author(s):

Huston, D.R. ( Univ. of Vermont (USA) )
Plumpton, J. ( Univ. of Vermont (USA) )
Esser, B. ( Univ. of Vermont (USA) )
Sullivan, G.A. ( JMAR/SAL (USA) )

Publication title:

Smart structures and materials 2004 : industrial and commercial applications of smart structures technologies : 16-18 March 2004, San Diego, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5388

Pub. Year:

2004

Page(from):

11

Page(to):

19

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453051 [0819453056]

Language:

English

Call no.:

P63600/5388

Type:

Conference Proceedings

Details

TDL ID:	ZA00013740
Series ID:	PA00000029
Conf. info. (Name):	Smart Structures and Materials
Conf. info. (Number):	2004
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	2004.03.16-2004.03.18

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