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Advanced module-based approach to effective CD prediction of sub-100nm patterns

Author(s):
Shin, J. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, I. ( Samsung Electronics Co., Ltd. (South Korea) )
Hwang, C. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, D.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
3 more
Publication title:
Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5378
Pub. Year:
2004
Page(from):
65
Page(to):
73
Pages:
9
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452917 [0819452912]
Language:
English
Call no.:
P63600/5378
Type:
Conference Proceedings

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