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Study of line edge roughness using continuous wavelet transform for 65-nm node

Author(s):
  • Shiu, L.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
  • Chen, C.-K. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
  • Gau, T.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
  • Lin, B.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1983
Page(to):
1991
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.3
Type:
Conference Proceedings

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