Long-term reliable operation of a MOPA-based ArF light source for microlithography

Long-term reliable operation of a MOPA-based ArF light source for microlithography

Author(s):

Ishihara, T. ( Cymer, Inc. (USA) )

Besaucele, H. ( Cymer, Inc. (USA) )

Maley, C.A. ( Cymer, Inc. (USA) )

Fleurov, V.B. ( Cymer, Inc. (USA) )

O'Keeffe, P. ( Cymer, Inc. (USA) )

Haviland, M.E. ( Cymer, Inc. (USA) )

Morton, R.G. ( Cymer, Inc. (USA) )

Gillespie, W.D. ( Cymer, Inc. (USA) )

Dyer, T.S. ( Cymer, Inc. (USA) )

Moosman, B. ( Cymer, Inc. (USA) )

Poole, R. ( Cymer, Inc. (USA) )

6 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1858

Page(to):

1865

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.3

Type:

Conference Proceedings

Details

TDL ID:	ZA00013729
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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