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Synthesis of projection lithography for low-k1 via interferometry

Author(s):
Cropanese, F.C. ( Rochester Institute of Technology (USA) )
Bourov, A. ( Rochester Institute of Technology (USA) )
Fan, Y. ( Rochester Institute of Technology (USA) )
Estroff, A. ( Rochester Institute of Technology (USA) )
Zavyalova, L.V. ( Rochester Institute of Technology (USA) )
Smith, B.W. ( Rochester Institute of Technology (USA) )
1 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1836
Page(to):
1842
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.3
Type:
Conference Proceedings

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