Verification of compaction and rarefaction models for fused silica with 40 billion pulses of 193-nm excimer laser exposure and their effects on projection lens imaging performance
- Author(s):
Algots, J.M. ( Cymer, Inc. (USA) ) Sandstrom, R. ( Cymer, Inc. (USA) ) Partlo, W. ( Cymer, Inc. (USA) ) Takahashi, K. ( Canon Inc. (Japan) ) Ishii, H. ( Canon Inc. (Japan) ) Hasegawa, Y. ( Canon Inc. (Japan) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1815
- Page(to):
- 1827
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.3
- Type:
- Conference Proceedings
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