Verification of compaction and rarefaction models for fused silica with 40 billion pulses of 193-nm excimer laser exposure and their effects on projection lens imaging performance

Verification of compaction and rarefaction models for fused silica with 40 billion pulses of 193-nm excimer laser exposure and their effects on projection lens imaging performance

Author(s):

Algots, J.M. ( Cymer, Inc. (USA) )

Sandstrom, R. ( Cymer, Inc. (USA) )

Partlo, W. ( Cymer, Inc. (USA) )

Takahashi, K. ( Canon Inc. (Japan) )

Ishii, H. ( Canon Inc. (Japan) )

Hasegawa, Y. ( Canon Inc. (Japan) )

1 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1815

Page(to):

1827

Pages:

13

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.3

Type:

Conference Proceedings

Details

TDL ID:	ZA00013729
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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