Development of high-power ArF/F2 laser platform for VUV microlithography

Development of high-power ArF/F2 laser platform for VUV microlithography

Author(s):

Kakizaki, K. ( Ushio Inc. (Japan) )

Fujimoto, J. ( Komatsu Ltd. (Japan) )

Yamazaki, T. ( Komatsu Ltd. (Japan) )

Suzuki, T. ( Komatsu Ltd. (Japan) )

Matsunaga, T. ( Komatsu Ltd. (Japan) )

Kawasuji, Y. ( Komatsu Ltd. (Japan) )

Watanabe, Y. ( Komatsu Ltd. (Japan) )

Kaminishi, M. ( Komatsu Ltd. (Japan) )

Inoue, T. ( Ushio Inc. (Japan) )

Mizoguchi, H. ( Gigaphoton Inc. (Japan) )

Kumazaki, T. ( Komatsu Ltd. (Japan) )

Ariga, T. ( Komatsu Ltd. (Japan) )

Watanabe, T. ( Komatsu Ltd. (Japan) )

Yabu, T. ( Komatsu Ltd. (Japan) )

Sasano, K. ( Komatsu Ltd. (Japan) )

Hori, T. ( Komatsu Ltd. (Japan) )

Wakabayashi, O. ( Komatsu Ltd. (Japan) )

Sumitani, A. ( Komatsu Ltd. (Japan) )

13 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1805

Page(to):

1814

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.3

Type:

Conference Proceedings

Details

TDL ID:	ZA00013729
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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