157-nm photoresist process optimization for a full-field scanner

157-nm photoresist process optimization for a full-field scanner

Author(s):

Light, S. ( IMEC (Belgium) and IMEC (Belgium) )

Stepanenko, N. ( IMEC (Belgium) and IMEC vzw (Belgium) )

Gronheid, R. ( IMEC (Belgium) )

Van Roey, F. ( IMEC (Belgium) )

Van den Heuvel, D. ( IMEC (Belgium) )

Goethals, A.-M. ( IMEC (Belgium) )

1 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1658

Page(to):

1668

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.3

Type:

Conference Proceedings

Details

TDL ID:	ZA00013729
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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