Evaluation systems of F2 laser lithography materials
- Author(s):
Itakura, Y. ( Komatsu Ltd. (Japan) ) Kawasa, Y. ( Komatsu Ltd. (Japan) ) Egawa, K. ( Komatsu Ltd. (Japan) ) Sumitani, A. ( Komatsu Ltd. (Japan) ) Sasaki, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Higasikawa, I. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Itani, T. ( NEC Electronics Corp. (Japan) ) Nakano, H. ( Canon Inc. (Japan) ) Hata, H. ( Canon Inc. (Japan) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1606
- Page(to):
- 1615
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.3
- Type:
- Conference Proceedings
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