Equivalent modeling technique for predicting the transient thermomechanical response of optical reticles during exposure

Equivalent modeling technique for predicting the transient thermomechanical response of optical reticles during exposure

Author(s):

Abdo, A.Y. ( Univ. of Wisconsin/Madison (USA) )
Engelstad, R.L. ( Univ. of Wisconsin/Madison (USA) )
Beckman, W.A. ( Univ. of Wisconsin/Madison (USA) )
Lovell, E.G. ( Univ. of Wisconsin/Madison (USA) )
Mitchell, J.W. ( Univ. of Wisconsin/Madison (USA) )

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1452

Page(to):

1461

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.3

Type:

Conference Proceedings

Details

TDL ID:	ZA00013729
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

Similar Items:

1 Conference Proceedings Predicting thermomechanical distortions of optical reticles for 157-nm technology Abdo,A.Y., Engelstad,R.L., Beckman,W.A., Mitchell,J.W., Lovell,E.G. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Thermomechanical modeling of the SCALPEL mask during exposure Martin,C.J., Engelstad,R.L., Lovell,E.G., Liddle,J.A. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Thermomechanical distortions of advanced optical reticles during exposure Chang,J., Abdo,A., Kim,B., Bloomstein,T.M., Engelstad,R.L., Lovell,E.G., Beckman,W.A., Mitchell,J.W. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Predicting microfluidic response during immersion lithography scanning Wei, A. C., Dicks, G. A., Abdo, A. Y., Nellis, G. F., Engelstad, R. L., Chang, J., Lovell, E. G., Beckman, W. A. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Experimental model verification of the thermal response of optical reticles Abdo,A.Y., Reu,P.L., Schlax,M.P., Engelstad,R.L., Beckman,W.A., Mitchell,J.W., Lovell,E.G. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Optimization of EUVL reticle thickness for image placement accuracy Zheng, L., Mikkelson, A.R., Abdo, A.Y., Engelstad, R.L., Lovell, E.G., White, T.J. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Thermomechanical modeling of the pin-chucked EUV reticle during exposure Wei, A.C., Martin, C.J., Beckman, W.A., Mitchell, J.W., Engelstad, R.L., Lovell, E.G., Blaedel, K.L. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Transient thermal distortions of x-ray mask membranes during exposure scanning Feng,Z., Engelstad,R.L., Lovell,E.G., Cerrina,F. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Thermomechanical distortions of ion-beam stencil masks during exposure Lee,P.-T., Kim,B., Frisque,G.A., Tejeda,R.O., Engelstad,R.L., Lovell,E.G., Beckman,W.A., Mitchell,J.W. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Mask-related distortions of modified fused silica reticles for 157-nm lithography Mikkelson,A.R., Abdo,A.Y., Cotte,E.P., Sohn,J., Engelstad,R.L., Lovell,E.G. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Thermomechanical modeling of the EUV reticle during exposure Martin,C.J., Engelstad,R.L., Lovell,E.G. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Thermamechanical global response of the EUVL wafer during exposure Chang, J., Martin, C.J., Engelstad, R.L., Lovell, E.G. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12