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Impact of illumination intensity profile on lithography simulation

Author(s):
  • Hwang, C. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Kim, I. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1427
Page(to):
1434
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.3
Type:
Conference Proceedings

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