Analysis of off-axis-illumination-based phase-edge/chromeless mask technologies

Analysis of off-axis-illumination-based phase-edge/chromeless mask technologies

Author(s):

Croffie, E.H. ( LSI Logic Corp. (USA) )
Taravade, K.N. ( LSI Logic Corp. (USA) )
Callan, N. ( LSI Logic Corp. (USA) )
Park, K. ( Dupont Photomasks, Inc. (USA) )
Hughes, G.P. ( Dupont Photomasks, Inc. (USA) )

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1279

Page(to):

1286

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013728
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

Similar Items:

1 Conference Proceedings Manufacturing of ArF chromeless hard shifter for 65-nm technology Park, K.-T., Dieu, L., Hughes, G.P., Green, K.G., Croffie, E.H., Taravade, K.N. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Error budget for a 193-nm complementary phase-shift mask Eib, N.K., Kobozeva, O., Neville, C., Croffie, E.H. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Electrical validation of resolution enhancement techniques Taravade, K.N., Callan, N.P., Croffie, E.H., Ahmad, A. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node Croffie, E.H., Eib, N., Callan, N.P., Baba-Ali, N., Latypov, A., Hintersteiner, J., Sandstrom, T., Bleeker, A., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Two-dimensional image-based model calibration for OPC applications Taravade, K.N., Croffie, E.H., Jost, A. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Multichip reticle approach for OPC model verification Taravade, K.N., Belova, N., Jost, A.M., Callan, N.P. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Analysis of etched quartz solutions for 65-nm node critical layer lithography Croffie, E.H., Callan, N.P. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Binary halftone chromeless PSM technology for λ/4 optical lithography Chen,J.F., Petersen,J.S., Socha,R.J., Laidig,T.L., Wampler,K.E., Nakagawa,K.H., Hughes,G.P., MacDonald,S.S., Ng,W. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Dark-field high-transmission chromeless lithography Bailey, G.E., Callan, N.P., Taravade, K.N., Jensen, J.V., Eynon, B.G., Martin, P.M., Kamberian, H.H., Taylor, D., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Study of optical proximity effects using off-axis illumination with attenuated phase shift mask C.-N. Ahn, K.-H. Baik, Y.-S. Lee, H.-E. Kim, I.-B. Hur Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Through pitch intensity balancing and phase error analysis of 193-nm alternating phase shift masks Nakagawa, K.H., Hughes, G.P., Park, K., Buck, P. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Phase defect printability analysis for chromeless phase lithography technology Huh, S., Park, J.H., Chung, D.-H., Kim, C.-H., Shin, I.-K., Choi, S.-W., Sohn, J.-M. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12