Blank Cover Image

Rigorous diffraction analysis using geometrical theory of diffraction for future mask technology

Author(s):
  • Chua, G.S. ( National Univ. of Singapore (Singapore) )
  • Tay, C.J. ( National Univ. of Singapore (Singapore) )
  • Quan, C. ( National Univ. of Singapore (Singapore) )
  • Lin, Q. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1267
Page(to):
1278
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings MEF studies for attenuated phase-shift mask for sub-0.13-μm technology using 248 nm

Tan, S.K., Lin, Q., Chua, G.S., Quan, C., Tay, C.J.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Characterization of assist features on impact of mask error enhancement factors for sub-0.13-um technology

Tan,S.K., Lin,Q., Tay,C.J., Quan,C.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Dipole options for 90-nm lithography technologies and below

Chua, G.S., Tay, C.J., Quan, C., Lin, Q., Chua, L.-H.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Mask error enhancement factor for sub-0.13-μm lithography

Tan,S.K., Lin,Q., Quan,C., Tay,C.J., See,A.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Sub-0.10-μm lithography technology with resolution enhancement technique

Chua, G.S., Lin, Q., Tay, C.J., Quan, C.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Customized illumination shapes for 193nm immersion lithography

M. L. Ling, G. S. Chua, Q. Lin, C. J. Tay, C. Quan

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography

M. L. Ling, G. S. Chua, C. J. Tay, C. Quan, Q. Lin

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Process window optimization of CPL mask for beyond 45nm lithography

S. Y. Tan, Q. Lin, C. J. Tay, C. Quan

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Optimized hardware and software for fast full-chip simulation

Chua, G. S., Tay, C. J., Quan, C., Lin, Q.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Rigorous diffraction analysis for future mask technology

Erdmann,A., Friedrich,C.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Impact of transmission error for attenuated phase-shift mask for 0.10-μm technology

Tan, S.K., Lin, Q., Quan, C., Tay, C.J.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings The study of chromeless phase lithography (CPL) for 45nm lithography [6349-98]

Tan, S. Y., Lin, Q., Tay, C. J., Quan, C.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12