Study of Cr patch validity for ArF CPL mask and its fabrication
- Author(s):
Kim, C.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, M.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Park, J.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Shin, I.-G. ( Samsung Electronics Co., Ltd. (South Korea) ) Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Yoon, H.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1247
- Page(to):
- 1254
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.2
- Type:
- Conference Proceedings
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