Experimental verification of a model-based decomposition method for double dipole lithography
- Author(s):
Eurlings, M. ( ASML (Netherlands) ) Hsu, S.D. ( ASML (USA) ) Hendrickx, E. ( IMEC (Belgium) ) op 't Root, W. ( Technische Univ. Eindhoven (Netherlands) ) Laidig, T.L. ( ASML (USA) ) Chiou, T.-B. ( ASML (Taiwan) ) Chen, A. ( ASML (Taiwan) ) Chen, F. ( ASML (USA) ) Vandenberghe, G. ( IMEC (Belgium) ) Finders, J. ( ASML (Netherlands) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1225
- Page(to):
- 1236
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.2
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Double dipole lithography for 65-nm node and beyond: a technology readiness review
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Contact hole reticle optimization by using interference mapping lithography (IML)
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Contact hole reticle optimization by using interference mapping lithography (IML)
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Development of automatic OPC treatment and layout decomposition for double dipole lithography for low-k1 imaging
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL)
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL)
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask
SPIE-The International Society for Optical Engineering |