MEV as a new constraint for lithographers in the sub-100-nm regime
- Author(s):
Trouiller, Y. ( LETI-CEA (France) ) Postnikov, S.V. ( Motorola (France) ) Lucas, K.D. ( Motorola (France) ) Sundermann, F. ( STMicroelectronics (France) ) Patterson, K. ( Motorola (France) ) Belledent, J. ( Philips Semiconductors (France) ) Couderc, C. ( Philips Semiconductors (France) ) Rody, Y.F. ( Philips Semiconductors (France) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1081
- Page(to):
- 1092
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.2
- Type:
- Conference Proceedings
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