Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET

Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET

Author(s):

Shieh, W.B. ( United Microelectronics Corp. (Taiwan) )

Chou, W. ( United Microelectronics Corp. (Taiwan) )

Yang, C.-H. ( United Microelectronics Corp. (Taiwan) )

Wu, J.K. ( United Microelectronics Corp. (Taiwan) )

Chen, N. ( United Microelectronics Corp. (Taiwan) )

Yen, S.M. ( United Microelectronics Corp. (Taiwan) )

Hsu, T. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

Tuan, S. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

Chang, D. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

Rudzinski, M.W. ( KLA-Tencor Corp. (USA) )

Wang, L. ( KLA-Tencor Corp. (USA) )

Son, K. ( KLA-Tencor Corp. (USA) )

7 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1047

Page(to):

1058

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013728
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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