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Developable bottom antireflective coatings for 248-nm and 193-nm lithography

Author(s):
Katayama, T. ( Clariant (Japan) K.K. (Japan) )
Motobayashi, H. ( Clariant (Japan) K.K. (Japan) )
Kang, W.-B. ( Clariant (Japan) K.K. (Japan) )
Toukhy, M.A. ( Clariant Corp. (USA) )
Oberlander, J.E. ( Clariant Corp. (USA) )
Ding, S.S. ( Clariant Corp. (USA) )
Neisser, M. ( Clariant Corp. (USA) )
2 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
968
Page(to):
973
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

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