Specification of the phase angle of a 6% attenuated PSM mask used in ArF lithography
- Author(s):
- Chang, C.H. ( United Microelectronics Corp. (Taiwan) )
- Schacht, J. ( Infineon Technologies AG (Germany) )
- Lin, B.S.-M ( United Microelectronics Corp. (Taiwan) )
- Hung, K.C. ( United Microelectronics Corp. (Taiwan) )
- Huang, I.H. ( United Microelectronics Corp. (Taiwan) )
- Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 902
- Page(to):
- 910
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.2
- Type:
- Conference Proceedings
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