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Calibration of OPC models for multiple focus conditions

Author(s):
Schacht, J. ( Infineon Technologies (Taiwan) )
Herold, K. ( Infineon Technologies (Taiwan) )
Zimmermann, R. ( Infineon Technologies (Taiwan) )
Torres, J.A. ( Mentor Graphics Corp. (USA) )
Maurer, W. ( Mentor Graphics Corp. (USA) )
Granik, Y. ( Mentor Graphics Corp. (USA) )
Chang, C.-H. ( United Microelectronics Corp. (Taiwan) )
Hung, G.K.-C. ( United Microelectronics Corp. (Taiwan) )
Lin, B.S.-M. ( United Microelectronics Corp. (Taiwan) )
4 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
691
Page(to):
702
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

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