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Fast calculation of images for high numerical aperture lithography

Author(s):
Rosenbluth, A.E. ( IBM Thomas J. Watson Research Ctr. (USA) )
Gallatin, G.M. ( IBM Thomas J. Watson Research Ctr. (USA) )
Gordon, R.L. ( IBM Semiconductor R&D Ctr. (USA) )
Hinsberg, W. ( IBM Almaden Research Ctr. (USA) )
Hoffnagle, J. ( IBM Almaden Research Ctr. (USA) )
Houle, F. ( IBM Almaden Research Ctr. (USA) )
Lai, K. ( IBM Semiconductor R&D Ctr. (USA) )
Lvov, A. ( IBM Thomas J. Watson Research Ctr. (USA) )
Sanchez, M. ( IBM Almaden Research Ctr. (USA) )
Seong, N. ( IBM Semiconductor R&D Ctr. (USA) )
5 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
615
Page(to):
628
Pages:
14
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

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