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Characterization of ACLV for advanced technology nodes using scatterometer-based lens fingerprinting technique

Author(s):
Wang, C.A. ( Texas Instruments Inc. (USA) )
Zhang, G. ( Texas Instruments Inc. (USA) )
DeMoor, S. ( Texas Instruments Inc. (USA) )
Tan, C. ( Texas Instruments Inc. (USA) )
Ilzhoefer, J. ( Texas Instruments Inc. (USA) )
Atkinson, C. ( Texas Instruments Inc. (USA) )
Wickman, C. ( ASML (USA) )
Hansen, S. ( ASML (USA) )
Geh, B. ( Carl Zeiss (Germany) )
Flagello, D.G. ( ASML (USA) )
Boehm, M. ( Texas Instruments Inc. (USA) )
6 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
581
Page(to):
590
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.1
Type:
Conference Proceedings

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