157-nm chromeless phase lithography with extremely high numerical aperture
- Author(s):
Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Matsuura, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 537
- Page(to):
- 544
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.1
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
157-nm lithography with extremely high numerical aperture lens for 45-nm technology node
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
157-nm lithography with high numerical aperture lens for 70-nm technology node
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |