The application of CPL reticle technology for the 0.045-mm node

The application of CPL reticle technology for the 0.045-mm node

Author(s):

Conley, W. ( Motorola (USA) )

Van Den Broeke, D.J. ( ASML (USA) )

Socha, R.J. ( ASML (USA) )

Wu, W. ( Motorola (USA) )

Litt, L.C. ( Motorola (USA) )

Lucas, K.D. ( Motorola (USA) )

Roman, B.J. ( Motorola (USA) )

Peters, R.D. ( Motorola (USA) )

Parker, C. ( Motorola (USA) )

Chen, F. ( ASML (USA) and ASML (Netherlands) )

Wampler, K.E. ( ASML (USA) and ASML (Netherlands) )

Laidig, T.L. ( ASML (USA) and ASML (Netherlands) )

Schaefer, E. ( ASML (USA) and ASML (Netherlands) )

Kuijten, J.-P. ( ASML (USA) and ASML (Netherlands) )

Verhappen, A. ( ASML (USA) and ASML (Netherlands) )

van de Goor, S. ( ASML (USA) and ASML (Netherlands) )

Chaplin, M. ( ASML (USA) and ASML (Netherlands) )

Kasprowicz, B.S. ( Photronics, Inc. (USA) )

Progler, C.J. ( Photronics, Inc. (USA) )

Robert, E. ( STMicroelectronics (France) )

Thony, P. ( STMicroelectronics (France) )

16 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

504

Page(to):

509

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013727
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

Similar Items:

1 Conference Proceedings CPL reticle technology for advanced device applications Conley, W.E., Van Den Broeke, D.J., Socha, R.J., Wu, W., Litt, L.C., Lucas, K.D., Roman, B.J., Peters, R.D., Parker, C., … SPIE - The International Society of Optical Engineering	7 Conference Proceedings The impact of MEEF through pitch for 120-nm contact holes Litt, L.C., Wu, W., Conley, W., Lucas, K.D., Roman, B.J., Montgomery, P., Kasprowicz, B.S., Progler, C.J., Socha, R.J., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings The impact of illumination on feature fidelity for CPL mask technology Kuijten, J. P., Verhappen, A., Conley, W., van de Goor, S., Litt, L., Wu, W., Lucas, K., Roman, B., Kasprowicz, B., … SPIE - The International Society of Optical Engineering	8 Conference Proceedings RET integration of CPL technology for random logic Hsu, S.D., Van Den Broeke, D.J., Chen, J.F., Shi, X., Hsu, M., Laidig, T.L., Conley, W., Litt, L.C., Wu, W. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Defect printability in CPL mask technology Kuijten, J.-P., Verhappen, A., Pijnenburg, W., Conley, W., Litt, L.C., Wu, W., Montgomery, P., Roman, B.J., Kasprowicz, … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Process, design, and optical proximity correction requirements for the 65-nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Process, design and optical proximity correction requirements for the 65nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings CPL mask technology for sub-100-nm contact hole imaging Kasprowicz, B.S., Conley, W.E., Litt, L.C., Van Den Broeke, D.J., Montgomery, P.K., Socha, R.J., Wu, W., Lucas, K.D., … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Application of chromeless phase lithography (CPL) masks in ArF lithography Kasprowicz, B.S., Progler, C.J., Wu, W., Conley, W., Litt, L.C., Van Den Broeke, D.J., Wampler, K.E., Socha, R.J. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12